About the conference

The 6th International Conference on Photo-Excited Processes and Applications will be held in Sapporo, Japan, in 9-12 September 2008. It will continue the tradition initiated at the 1993 Conference in Sendai, Japan, and strengthened at successive meetings in Jerusalem, Israel, in 1995, Strasbourg, France, in 1999, Lecce, Italy, in 2004, and Charlottesville, USA, in 2006.

ICPEPA-6 will bring together researchers from many countries involved in experimental, theoretical, and computational investigations in the general area of photon-assisted material processing. In addition to the traditional areas of laser-matter interaction, modeling and simulation of photo-excited processes, laser-assisted film deposition and surface processing, the topics emphasized in the program of ICPEPA-6 include laser interactions with biomolecules, 3D photofabrication, and laser applications in nanotechnology, biotechnology, and industry.

It is intended for researchers and developers involved in experimental, modeling and theoretical aspects of relevant photo-assisted processes with current and future applications in microelectronics, optoelectronics, metallurgy and general surface science and technology.